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As a diamond application, it involves a wide range of technologies and is very difficult, requiring mutual cooperation and research in various fields before it can be realized in a relatively short period of time. In the future, there is a continuous need to develop and improve the CVD diamond growth technology, to develop the CVD diamond film in acoustic, optical, electrical applications, it has become a high-tech development of the twenty-first century new materials. the application of CVD can be used for both engineering materials, but also can be used as a functional material, the following is only a little bit of its functional applications to introduce.

What is functional material? Functional materials are materials which are used in industry and technology for physical and chemical functions, such as optical, electrical, magnetic, acoustic, thermal and other characteristics, including electrical functional materials, magnetic functional materials, optical functional materials, superconducting materials, biomedical materials, functional membranes, etc. Functional materials can be used as engineering materials or functional materials.

What is functional membrane? What are its characteristics? Functional membrane is a thin film material with physical properties such as optical, magnetic, electric filtration, adsorption, and chemical properties such as catalytic and reactive properties.

Characteristics of thin-film materials: Thin-film materials are typically two-dimensional materials, i.e., they are large in two scales and small in the third. Compared with the commonly used three-dimensional bulk materials, they have many characteristics in terms of performance and structure. The biggest feature is that certain properties of functional films can be realized by special film preparation methods at the time of preparation. This is the reason why thin-film functional materials have become a hot material for people's attention and research.

As two-dimensional materials, the most important feature of thin-film materials is the so-called dimensional characteristics, which can be used to realize the miniaturization and integration of various components. Many uses of thin film materials are based on this, most typically for integrated circuits and to increase the storage density of computer memory components.

Due to the small size, the surface and interface of thin film materials accounted for a large relative proportion of the surface of the relevant properties of the surface is extremely prominent, there are a series of physical effects related to the surface interface.

(1) selective transmission and reflection due to optical interference effects; and

(2) Inelastic scattering of electrons colliding with the surface, so that the electrical conductivity, Hall coefficient, current magnetic field effect, etc. change.

(3) Because the thickness of the film is much smaller than the mean free range of electrons, and with the electrons of the Drobrijs wavelength is similar to the electrons between the two surfaces of the film back and forth movement of the electrons will interfere with the surface perpendicular to the movement of the energy associated with the surface will take a discrete value, which will have an impact on electron transport;; and

(4) At the surface, the periodic interruption of atoms, resulting in surface energy levels, the number of surface states and the number of surface skin atoms have the same order of magnitude, for semiconductors and other substances with few carriers will have a great impact;; and

(5) The number of neighboring atoms of surface magnetic atoms decreases, causing an increase in the magnetic moment of surface atoms; and

(6) Thin film material anisotropy and so on.

Due to the thin film material properties affected by the preparation process, most of the non-equilibrium state in the preparation process, so you can change the composition and structure of the thin film material in a wide range, not subject to the limitations of the equilibrium state, so people can prepare a lot of block difficult to achieve the material, get new properties, which is an important feature of thin film materials, but also thin film materials caused by the attention of the important reason. Designed thin films can be obtained either by chemical or physical methods.